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       IM Publications LLP :: Surface Analysis :: Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy

 

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Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy
Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy
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If Briggs and Seah has been your guide in the past, you will want this book.

Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS or ESCA) are well-established techniques for surface analysis and also (when combined with sputter depth profiling) for thin film and interface analysis.

This book is the first comprehensive treatment of the subject for over 10 years, during which time there have been many advances in instrumentation and performance, understanding of electron spectroscopy fundamentals, experimental methodology and data interpretation, which have markedly enhanced the capabilities of AES and XPS. All this new information is now integrated into a thoroughly up-to-date reference volume for the benefit of researcher and practical analyst alike.

31 chapters cover the following areas:
  • perspectives and history;
  • basic principles and spectral features;
  • instrumentation;
  • sample handling and beam effects;
  • electron transport and surface sensitivity;
  • quantification; spectral interpretation and structural effects;
  • depth profiling;
  • imaging;
  • developing aspects.
There are also extensive appendices of reference data.

The authors are all internationally recognised and come from Australia, Europe, Japan and the USA.
 
 
Contents

  • Introduction
  • Perspectives on XPS and AES
  • XPS: Basic Principles, Spectral Features and Qualitative Analysis
  • AES: Basic Principles, Spectral Features and Qualitative Analysis
  • Instrumentation
  • Surface Analysis: The Specimen "Journey from Collection, Storage, Transportation, and Preparation to Analysis“
  • XPS: Instrumentation and Performance
  • AES: Instrumentation and Performance
  • Instrument Calibration for AES and XPS
  • Analysing Insulators with XPS and AES
  • Beam Effects During AES and XPS Analysis
  • Surface Sensitivity
  • Electron Transport in Solids
  • Electron Attenuation Lengths
  • Quantification
  • Quantification of Nanostructures by Electron Spectroscopy
  • Quantification in AES and XPS
  • The Use of Chemometrics in AES and XPS Data Treatment
  • Spectral Interpretation
  • XPS Lineshapes and Curve-fitting
  • Chemical Effects in XPS
  • Chemical Information from Auger Lineshapes
  • The Auger Parameter
  • XPS Valence bands studied by XPS
  • Structural
  • Effects in XPS and AES: Diffraction
  • Electron Backscattering and Channeling
  • Depth Profiling
  • AES/XPS Depth Profiling
  • Angle Resolved XPS
  • Imaging
  • XPS Imaging
  • Processing, Interpretation and Quantification of Auger Images
  • Developing Aspects
  • X-ray Photoelectron Spectroscopy and Imaging at Synchrotrons
  • Total Reflection X-ray Photoelectron Spectroscopy (TRXPS)
  • Ion-Excited Auger Electron Spectroscopy
  • Positron-Annihilation Induced AES (PAES)
  • Electron Coincidence Measurements
  • Recent Developments in the Theory of Auger Spectroscopy
  • Appendices
  • XPS BE
  • AES KE
  • Beam Damage
  • Manufacturers
  • Software
  • Databases
  • Standards

Details
 
AUTHOR(S)/ED(S) David Briggs, John T. Grant (Eds)
BINDING Hardback
PUBLISHED 2003
NO. PAGES 899
AVAILABILITY In stock for immediate despatch

Price:
£180.00

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