Rik van de Bovenkamp (Tpf)
| Posted on Monday, September 05, 2005 - 5:36 am: | |
Dear all, One of my customers asked me to help on the following problem: In his (semiconductor)process a mix of N2 and C2H2Cl2 (DCE) is used. The concentration is 0.3-3% of DCE vapor in N2. He wants to detect whether there is DCE in the N2 gasstream or not. I was thinking of using NDIR principle to detect DCE. My questions are: 1. Is this possible at all? 2. Does such a (of course low cost) instrument excist)? 3. Would it be relatively simple to develop and manufacture an instrument that can detect if DCE 0.3% is in the N2 gasstream with IR-source and sensing (in combintation with the appropriate filter) chips? Much obliged, Rik van de Bovenkamp TPF-Control The Netherlands |