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Rik van de Bovenkamp (Tpf)
Posted on Monday, September 05, 2005 - 5:36 am:   

Dear all,

One of my customers asked me to help on the following problem:

In his (semiconductor)process a mix of N2 and C2H2Cl2 (DCE) is used. The concentration is 0.3-3% of DCE vapor in N2.
He wants to detect whether there is DCE in the N2 gasstream or not.
I was thinking of using NDIR principle to detect DCE.
My questions are:

1. Is this possible at all?
2. Does such a (of course low cost) instrument excist)?
3. Would it be relatively simple to develop and manufacture an instrument that can detect if DCE 0.3% is in the N2 gasstream with IR-source and sensing (in combintation with the appropriate filter) chips?

Much obliged,

Rik van de Bovenkamp
TPF-Control
The Netherlands

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