|
Gas-phase ion chemistry of
GeH4/B2H6 mixtures Lorenza Operti, Roberto Rabezzana,* Francesca Turco and Gian Angelo
Vaglio Dipartimento di Chimica Generale ed Organica Applicata and NIS Centre of Excellence, Università di Torino, C.so Massimo d'Azeglio 48, 10125 Torino,
Italy. E-mail: roberto.rabezzana@unito.it
ABSTRACT:
The gas phase ion–molecule reactions in positively and negatively ionized germane/diborane mixtures have been studied
by ion trap mass spectrometry. Reaction sequences and rate constants for the most interesting processes have been determined. In positive ionization, formation of Ge-B bonds
exclusively occurs through condensation reactions of BnHm+ ions with germane, followed by H2 or
BH3 loss. No reactions of ions from germane with B2H6 were observed under the experimental conditions used here. In negative
ionization, the GenHm– (n = 1, 2) ion families react with diborane to yield the
GenBpHq– (p = 1, 2) ions, again via dehydrogenation and BH3 loss,
while diborane anions proved to be unreactive. In both positive and negative ionization, Ge-B ions reach appreciable abundances. The present results afford fundamental
information about the intrinsic reactivity of gas-phase ions and provide valuable indications about the first nucleation steps ultimately leading to amorphous Ge and B-doped
semiconductor materials by chemical vapor deposition methods.
Keywords:
ion trap mass spectrometry, gas-phase ion chemistry, germane, diborane, semiconductors
Back to Table of Contents |